IN TERMS OF:
The coating chamber is loaded
A high vacuum is required when depositing PVD coatings.
The evacuation in PLATIT coating units takes place in two steps:
The chamber is heated up; process temperatures are about 150 - 500°C
PLATIT coating units work with three different etching processes:
Coating deposition with PVD (ARC, SPUTTER or hybrid LACS® technology) or PECVD processes
Cooling of the coating chamber
The coating chamber is unloaded
Etching with LGD® can process even complex surfaces and cavities, in addition to the cutting-edges and corners (e.g. of hobs, molds & dies), thanks to the plasma with high ion density, generated by an electron flow between two cathodes.