Hybrid LACS® (LAteral ARC with Central SPUTTERING):

  • High ion density, excellent adhesion
  • High deposition rates
  • Introduction of “new” materials by SPUTTERING of ceramic targets
  • Smoother coatings
Two different types of this hybrid technology can be applied in the Pi411 coating unit

1. Simultaneous deposition by LGD® & SCIL®

Lateral Glow Discharge & SPUTTERED Coating Induced by Lateral Glow Discharge

  • To increase ion density and affect the coating properties of SPUTTER coatings

1 - 3: LARC® cathode
4: SCIL® cathode

Simultaneous deposition by etching and sputter technology

2. Simultaneous deposition by LARC® & SCIL®

ARC evaporation with LAteral Rotating Cathode & SPUTTERED Coating Induced by Lateral Glow Discharge

  • For targeted doping of coating components

1 - 3: LARC® cathode
4: SCIL® cathode

Simultaneous deposition by arc and sputter technology

Learn more about the hybrid technology in the technical article "Hybrid Coating for Tooling".

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