Pi111

Pi111 PLUS G3 represents the third generation of a compact PVD coating unit from PLATIT. Its key features are fast cycle times, easy operation and user-friendliness at a favorable price – without compromising coating performance. Having two rotating cathodes utilizing ARC technology, the unit deposits selected PLATIT Signature Coatings at a consistently high level of quality. It is the ideal choice for customers looking to enter the coating world or wanting to add a fast, low volume PVD system to their fleet of machines.

Technologies applied:

  • 2 x LARC® PLUS (LAteral Rotating PLUS Cathode) for ARC deposition

Advantages of LARC® PLUS compared to LARC®:

  • Improved target utilization (up to 30%)
  • Enhanced magnetic field system and thus increased deposition rate
  • Quick cathode exchange

Etching technologies applied:

  • LGD® (Lateral Glow Discharge)
  • Plasma etching with argon, glow discharge
  • Metal ion etching (Ti, Cr)

Load and cycle times:

  • Max. coating volume [mm]: ø353 x H498
  • Max. coating height with defined coating thickness: 414mm
  • Max. load: 160kg
  • 4 - 5 batches/day

Modular carousel systems:

  • Dual rotation kicker carousel or triple rotation gearbox system

Software:

  • Simple use and maintenance
  • PLATIT’s SmartSoftware (PC and PLC system)
  • Modern control system with touch screen
  • Data recording and real-time display of process parameters and flow
  • Manual and automatic process control
  • Remote diagnostics and maintenance

Machine dimensions:

  • Footprint [mm]: W2000 x D1550 x H2250

Downloads:

Animation video

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