PL711 is a compact SPUTTER coating unit based on HiPIMS technology (High Power Impulse Magnetron SPUTTERING). It’s equipped with two Planar HiPIMS cathodes and enables the deposition of selected nitride as well as carbon-based coatings (WC/C, DLC2, DLC3) using highly productive processes. An efficient plasma utilization is achieved through an additional booster, the PLATIT 3D module.
The PA3D module with a central anode focuses a dense, three-dimensional plasma with a high ionization degree in the carousel and thus generates homogeneous coatings and a high deposition rate. Coatings from the PL711 provide outstandingly smooth surfaces with a high density, hardness and excellent adhesion.
SPUTTER nitride coatings
SPUTTER Cr & a-C:H:Si
SPUTTER Cr & ta-C + a-C