Pi1511

Pi1511 is a high-volume PVD coating unit. It combines three rotating PLATIT LARC® XL cathodes positioned inside the door with two Planar ARC cathodes in the back of the chamber. The combination of round cathodes with the high performing Planar cathodes allows the deposition of the PLATIT Signature Coatings with familiar flexibility. The LARC® XL cathodes have a very long lifetime and thus guarantee high productivity at a low cost per tool.

Technologies applied:

  • 3 x LARC® XL (LAteral Rotating XL Cathode) inside the door &
    2 x Planar cathodes in the back with ARC technology
  • MAC-3C (Magnetic ARC Confinement – Coil Current Compensation) for automated magnetic field adjustment
  • Quick cathode exchange
  • Deposition of PLATIT Signature Coatings

Etching technologies applied:

  • LGD® (Lateral Glow Discharge)
  • Plasma etching with argon, glow discharge
  • Metal ion etching (Ti, Cr)

Load and cycle times:

  • Max. coating volume [mm]: ø715 x H805
  • Max. coating height with defined coating thickness: 711mm
  • Max. load: 400kg
  • 3 batches/day

Modular carousel systems:

  • 1 to 12 axes

Software:

  • Simple use and maintenance
  • PLATIT’s SmartSoftware (PC and PLC system)
  • Modern control system with touch screen
  • Statistics and help function via user interface
  • Data recording and real-time display of process parameters and flow
  • Manual and automatic process control
  • Remote diagnostics and maintenance

Machine dimensions:

  • Footprint [mm]: W4900 x D2200 x H2450

Downloads:

Animation video

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