PLATIT Pi111 family – for a smart start
The PLATIT Pi111 family coating units are perfect for smaller PVD coating volumes, making them ideal entry-level units:
- Pi111 TRM with 2 x bipulse HiPIMS rotary magnetrons
- Pi111 G3 with 2 x LARC PLUS cathodes for arc deposition
- Coating volume: max. ø353 x H498mm
- Coating height with defined coating thickness: max. 414mm
- Load: max. 160kg
- Batches/day: 4-5
- Footprint: 1930 x 1560 x 2220mm (W x D x H)
PLATIT Pi411 G3 – for unlimited flexibility
The PLATIT Pi411 G3 offers you more options and can be quickly adapted to changing requirements:
- ECO basic configuration with 3 LARC cathodes for ARC coating
- Expandable with PECVD, CERC, OXI, SCIL and LACS
- Coating volume: max. ø540 x H500mm
- Coating height with defined coating thickness: max. 414mm
- Load: max. 200kg
- Batches/day: 4-5
- Footprint: 2950 x 1900 x 2400mm (W x D x H)
PLATIT PL711 – for DLC coatings
The PLATIT PL711 gives your components and tools diamond-like coatings for particularly low-friction surfaces and a long service life:
- 2 planar SPUTTER cathodes with HiPIMS technology
- Coating volume: max. ø600 x H805mm
- Coating height with defined coating thickness: max. 500mm
- Load: max. 250kg
- Batches/day: 2
- Footprint: 3540 x 2250 x 2595mm (W x D x H)
PLATIT PL1011 SAT – for maximum productivity
With the PLATIT PL1011 SAT you can coat large quantities of tools per day:
- 4 planar cathodes with ARC technology
- Double-pulsed and plasma-nitriding function
- Coating volume: max. ø715 x H805mm
- Coating height with defined coating thickness: max. 750mm
- Load: max. 750kg
- Batches/day: 3-4
- Footprint: 4700 x 2250 x 2350mm (W x D x H)
PLATIT Pi1511 – for your technological lead
Thanks to the PLATIT Pi1511, you can create PVD coatings that are state-of-the-art and give you a head start:
- 3 LARC XL cathodes and 2 planar cathodes for ARC coating
- MAC-3C for automated magnetic field adjustment
- Coating volume: max. ø715 x H805mm
- Coating height with defined coating thickness: max. 711mm
- Load: max. 750kg
- Batches/day: 3
- Footprint: 5000 x 2200 x 2500mm (W x D x H)
PLATIT S-MPuls – for coin minting
PLATIT has developed a special unit for achieving high-quality PVD coatings with a strong amorphous structure, high density, high surface quality and high accuracy especially for coin minting application:
- 1 pulsed DC magnetron SPUTTER cathode with rotating magnetic field
- Coating diameter with defined coating thickness: ø70-250mm
- Load: max. 20kg
- Batches/day: 4-6
- Footprint: 945 x 1403 x 2068mm (W x D x H)
- Footprint control cabinet: 608 x 1369 x 2068mm (W x D x H)
PLATIT Mega-PiMS – for rotating components
The PLATIT Mega-PiMS is a unit specifically designed for the PVD coating of rotating components and rollers:
- 1 SPUTTER cathode
- Coating volume with defined coating thickness: max. ø600 x L2000 mm
- Load: max. 1000kg
- Footprint: 4100 x 2900 x 2700mm (W x D x H)
- Footprint control cabinet: 1900 x 1100 x 2200mm (W x D x H)
PLATIT PL2011 – for particularly large volumes
A single PLATIT PL2011 has enough capacity for even the most demanding PVD coating volumes:
- 6 planar ARC cathodes, 4 of them with pulsed ARC power supplies
- Coating volume: max. ø1400 x H700mm
- Load: max. 1800kg
- Batches/day: 2-5
- Footprint: 8000 x 5800 x 2350mm (W x D x H)
PLATIT Pi603 – for saw bands
The PLATIT Pi603 allows you to coat saw bands in the highest quality directly in the coil:
- 3 LARC cathodes with ARC technology
- 1 planar ARC cathode for uniform PVD coating
- Outside diameter of the coil: max. 1360mm
- Inner diameter of the coil: 560mm
- Saw band height: max. 100mm
- Load: Coil weight incl. carrier max. 600kg
- Batches/day: 3
- Footprint: 5900 x 6450 x 3100mm (W x D x H)
Comparison of our PVD coating units for cutting tools
Pi111 G3
Pi411 G3
PL1011 SAT
Pi1511
PL2011
Max. coating volume [mm]
ø 353 x
H 498ø 540 x
H 500ø 715 x
H 805ø 715 x
H 805ø 1400 x H 700
Max. load [kg]
160
200
750
750
1800
ARC technology cathodes
2 x LARC PLUS
3 x LARC AFM
4 x Planar ARC cathode with 8 x ARC power supplies in both DC and pulsed modes
3 x LARC XL cathode,
2 x Planar cathode6 x Planar ARC cathode, 4 of which pulsed with ARC power supplies
SPUTTERING (DCMS, HiPIMS)
technology cathodes-
Upgradable with:
1 × central SCIL
1 × central FMS
1 × LARC RM (door, pos.2)-
-
-
Hybrid-LACS® technology with simultaneous ARC & SPUTTER processes
-
Yes, upgradable
-
-
-
DLC
Upgradable for DLC1 with TiCN option
DLC1, upgradable for ta-C sputtering
(DLC3), PECVD (DLC2)DLC1, upgradable for PECVD
(DLC2)-
-
OXI
-
Upgradable for oxide coatings
-
-
-