The PL1011 G4 from PLATIT is already the fourth generation of the robust PVD coating unit. It offers the perfect solution if you value process reliability and high-quality PVD coatings while aiming for low unit costs per coating.
The new design represents a quantum leap in several respects. The simpler design makes maintenance easier and the new technological features, such as plasma-nitriding and double-pulsed options, improve the coating properties and process for a wide range of applications.
The PL1011 G4 is the core of every large-volume coating center and combines maximum production availability with a user-friendly application and maintenance concept. It features four planar cathodes with state-of-the-art arc coating technology, which can deposit all PLATIT standard coatings in reproducible high quality.
Several etching technologies can be used with the PLATIT PL1011 G4 coating unit, offering various advantages: