PLATIT PL1011 G4 – for maximum productivity

The PL1011 G4 from PLATIT is already the fourth generation of the robust PVD coating unit. It offers the perfect solution if you value process reliability and high-quality PVD coatings while aiming for low unit costs per coating.

The new design represents a quantum leap in several respects. The simpler design makes maintenance easier and the new technological features, such as plasma-nitriding and double-pulsed options, improve the coating properties and process for a wide range of applications.

The PL1011 G4 is the core of every large-volume coating center and combines maximum production availability with a user-friendly application and maintenance concept. It features four planar cathodes with state-of-the-art arc coating technology, which can deposit all PLATIT standard coatings in reproducible high quality.


  • 4 planar cathodes with arc technology
  • Double-pulsed function
  • Plasma-nitriding function

Etching processes

Several etching technologies can be used with the PLATIT PL1011 G4 coating unit, offering various advantages:

  • LGD® (Lateral Glow Discharge)
  • Plasma etching with argon, glow discharge
  • Metal ion etching (Ti, Cr)

Load and cycle times

  • Coating volume: max. ø715 x H805mm
  • Coating height with defined coating thickness: max. 711mm
  • Load: max. 750kg (higher loads on request)
  • Batches/day: 3-4

Modular carousel systems

  • 1-12 axes


  • PLATIT SmartSoftware (PC and PLC system)
  • Easy operation and maintenance
  • Modern user interface with menu navigation on touch screen
  • Real-time process visualization incl. data recording and data management
  • Manual and automatic process control
  • Remote diagnosis and maintenance possible
  • Newly developed recipe editor


  • Footprint: 4000 x 2250 x 2350mm (W x D x H)
  • Footprint Double-Pulsed: 4700 x 2250 x 2350mm (W x D x H)


Animation video

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