PLATIT Pi111 PLUS G3 – for a smart start

The Pi111 PLUS G3 is the third generation of PLATIT’s small PVD coating unit. It offers short cycle times, simple operation and high user-friendliness at an attractive price – without compromising on coating performance. Thanks to two rotating cathodes with arc technology, the unit enables to deposit selected PLATIT Signature Coatings in reproducible high-quality.

The Pi111 PLUS G3 is the best choice for customers looking for a high-quality entry into the coating world or those who want to add a fast, low-volume PVD unit to their machinery.


  • 2 x LARC® PLUS cathode (LAteral Rotating Cathode) for arc coating

Compare the advantages of LARC® PLUS cathodes versus LARC® cathodes:

  • Up to 30% improved target utilization
  • Increased deposition rate thanks to optimized magnetic field system
  • Quick cathode exchange

Etching processes

Several etching technologies can be used with the PLATIT Pi111 PLUS G3 coating unit, offering various advantages:

  • LGD® (Lateral Glow Discharge)
  • Plasma etching with argon, glow discharge
  • Metal ion etching (Ti, Cr)

Load and cycle times

  • Coating volume: max. ø353 x H498mm
  • Coating height with defined coating thickness: max. 414mm
  • Load: max. 160kg
  • Batches/day: 4-5

Modular carousel systems

  • Carousel with 2 kickers or
  • Triple-rotation gearbox system


  • PLATIT SmartSoftware (PC and PLC system)
  • Easy operation and maintenance
  • Modern user interface with menu navigation on touch screen
  • Real-time process visualization incl. data recording and data management
  • Manual and automatic process control
  • Remote diagnosis and maintenance possible


  • Footprint: 2000 x 1550 x 2250mm (W x D x H)


Animation video

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Building a PVD coating unit in 30 minutes

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