PLATIT Pi111 PLUS G3 – for a smart start
The Pi111 PLUS G3 is the third generation of PLATIT’s small PVD coating unit. It offers short cycle times, simple operation and high user-friendliness at an attractive price – without compromising on coating performance. Thanks to two rotating cathodes with arc technology, the unit enables to deposit selected PLATIT Signature Coatings in reproducible high-quality.
The Pi111 PLUS G3 is the best choice for customers looking for a high-quality entry into the coating world or those who want to add a fast, low-volume PVD unit to their machinery.
Technology
- 2 x LARC® PLUS cathode (LAteral Rotating Cathode) for arc coating
Compare the advantages of LARC® PLUS cathodes versus LARC® cathodes:
- Up to 30% improved target utilization
- Increased deposition rate thanks to optimized magnetic field system
- Quick cathode exchange
Etching processes
Several etching technologies can be used with the PLATIT Pi111 PLUS G3 coating unit, offering various advantages:
- LGD® (Lateral Glow Discharge)
- Plasma etching with argon, glow discharge
- Metal ion etching (Ti, Cr)
Load and cycle times
- Coating volume: max. ø353 x H498mm
- Coating height with defined coating thickness: max. 414mm
- Load: max. 160kg
- Batches/day: 4-5
Modular carousel systems
- Carousel with 2 kickers or
- Triple-rotation gearbox system
Software
- PLATIT SmartSoftware (PC and PLC system)
- Easy operation and maintenance
- Modern user interface with menu navigation on touch screen
- Real-time process visualization incl. data recording and data management
- Manual and automatic process control
- Remote diagnosis and maintenance possible
Dimensions
- Footprint: 2000 x 1550 x 2250mm (W x D x H)